Lithography Resolution Calculator
Wavelength λ
193 nm
Numerical Aperture NA
1.35
Process factor k₁
0.25
g-line
i-line
KrF
ArF dry
ArF imm.
EUV 0.33
EUV 0.55
R = k₁ · λ / NA
Minimum half-pitch
35.7 nm
DOF ≈ 106 nm
Airy disk pattern (two point sources)